Raith 150 E-Beam Lithography System

Alt=Raith 150 E-Beam Lithography SystemSrc=/sites/partnerships.charlotte.edu/files/media/5267-1.jpgRaith 150 E-Beam Lithography System

Ultra high resolution Ebeam lithography and metrology tool. suitable for the development of Nanolithographic structures for microelectronic, MEMS, Photonic, and Integrated optical devices.

  • Ultimate resolution specified to 60nm with sub-30 features possible.
  • Accurate field stitching (~50nm) and overlay to better than 30nm typical.
  • Ultra high resolution, low voltage SEM inspection with advanced sample navigation and metrology software packages.
  • Direct E-beam exposure for chips and wafers to 150 mm diameter.